Stress measurement of deposited SiO2 films on silicon wafer using dimensional stability holographic interferometry test
Salamo%2C Gregory J.
- Title
- Stress measurement of deposited SiO2 films on silicon wafer using dimensional stability holographic interferometry test
- Authors
- Dovgalenko, G.E.; Haque, M.S.; Kniazkov, A.V.; Onischenko, Y.I.; Salamo, G.J.; Naseem, H.A.
- Journal
- Optical Manufacturing and Testing Ii
- Volume
- 3134
- Issue
- Year
- 1997
- Start Page
- 475
- URL
- ISBN/ISSN
- 0277-786X
- DOI
- 10.1117/12.295149